Embedded Files
- Negative Tone Resist Composition for Lithography
Santu Nandi, Lalit Khillare, Mohamad G. Moinuddin, Sunil Kumar, Manvendra Chauhan, Satinder K. Sharma, Kenneth E. Gonsalves, Subrata Ghosh
Filed, 08.11.2021, (Application No. 202111050981)(Granted)
2. A process for i- line resist dissolution modulation using hydroxy-styrene based ter-polymer
2. A process for i- line resist dissolution modulation using hydroxy-styrene based ter-polymer
Santu Nandi, Lalit Khillare, M.Yogesh, Suman Dolai, Chullikkattil P. Pradeep, Satinder K. Sharma, Anvesh Bogavelly, Deep Narayan Tiwari, Paritosh Jain, Subrata Ghosh, Kenneth E. Gonsalves, Surinder Singh
Filed, 23.02.2021, (Application No. 202141007495)
3. A system for detecting biological molecule and method of using the same
3. A system for detecting biological molecule and method of using the same
Shubhajit Roy Chowdhury, Subrata Ghosh, Prosenjit Mondal, Yashika Arora, Bidisha Biswas, Soham Mukherjee, Vaibhab Bedi
Filed, 2018 (Application No. 201811047739)
4. Compounds for Visualization and Quantification of Albumin, Method for Preparation and use Thereof
4. Compounds for Visualization and Quantification of Albumin, Method for Preparation and use Thereof
Gourab Dey, Prosenjit Mondal, Subrata Ghosh
Filed, 2017, (Application No. 201711003716)
5. A new class of Non-Chemically Amplified Molecular Photoresists For Next Generation Integrated Circuits (ICs) Technology
5. A new class of Non-Chemically Amplified Molecular Photoresists For Next Generation Integrated Circuits (ICs) Technology
Kenneth E. Gonsalves, Subrata Ghosh, Chullikkattil P. Pradeep, Satinder K. Sharma, Neha Thakur, P. Guruprasad Reddy, Santu Nandi, Midathala Yogesh
Filed, 24.12.2016, (Application No. 201611044190)
6. Molecular Design and Development of Advanced High Performance and Reliable Green Explosives
6. Molecular Design and Development of Advanced High Performance and Reliable Green Explosives
Subrata Ghosh, Pankaj Gaur, Sunil Kumar, Sagarika Dev, Prem Felix Siril, Pramod Soni
Filed, 2016, (Application No. 201611002646)
7. Resist Technology Based on Polyarylene sulphide: (PAS) as a Unique Polymer Material for Semiconductor Fabrication Technology
7. Resist Technology Based on Polyarylene sulphide: (PAS) as a Unique Polymer Material for Semiconductor Fabrication Technology
Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal
Filed, 2016, (Application No. 201611018061)
8. Highly Sensitive MAPDSM-MAPDST Based Resists Technology For Next Generation Lithography Applications
8. Highly Sensitive MAPDSM-MAPDST Based Resists Technology For Next Generation Lithography Applications
Kenneth E. Gonsalves, Satinder K. Sharma, Subrata Ghosh, Chullikkattil P. Pradeep, Pulikanti Guruprasad Reddy, Satyendra P. Pal, Pawan Kumar
Filed, 2016, (Application No. 201611022219)
9. Compositions and methods for inhibiting β-amyloid secretion
9. Compositions and methods for inhibiting β-amyloid secretion
Janathan D. Smith, Enakshi Chakrabarti, Subrata Ghosh, Marty Sayre, Gregory P. Tochtrop
US 2013/0158112 A1
Indian Institute of Technology Mandi, H.P, India
Phone: +91-1905-26-7069
E-mail: subrata@iitmandi.ac.in
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