Research Areas

Inorganic resists have emerged as promising candidates in semiconductor industries to realize sub-10 nm node technology. However, controlling vertical shrinkage of resist films during the pattern development process, particularly for ultralow thin film applications, is among the highly pressing limitations of inorganic resists along with pattern roughness and poor resist shelf-life characteristics. Tin-based clusters and small molecules have been recently introduced as resist materials. They possess a high absorption coefficient and fast solubility transitions under irradiation exposure. Here we work for the design and development of organic and organic-inorganic hybrids for various such photoresist applications.  

Organic Materials for light emitting applications (LED): Planar luminophores assumed to be non emissive in solid state and thus led to their exclusion of planar molecules from the field of solid state applications. Since the light emission application area demands highly energy efficient emissive organic luminophores, development of same is highly desired. Moreover, in the present scientific world, not only the development of efficient materials is necessary but simultaneously, there is a great need to develop literature to understand and solve problems. Herein we are working to develop simple ways to turn aggregation quencher to aggregation emitter possible via synthetic organic tools along with development of molecular level understanding of the phenomenon is also an important part of research.

Our research focuses primarily on developing innovative synthetic methodologies, particularly aimed at enhancing existing methods in terms of application, sustainability, and molecular/procedural efficiency.

Consequently, three primary studies focus on utilizing the distinctive reactivity of transition metal catalysts. 1. Development of Methodology and Innovative Catalytic Concepts; 2. Advanced Catalyst Design; 3. and various applications.